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11 Sep 2017
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The centrotherm CT-D dry bed absorber offers you a safe and efficient disposal of harmful gases which are used in the semiconductor and photovoltaic industry, without any special demands on your media supply. Our CT-D dry bed absorber is a passive system that only requires an electrical supply and CDA or nitrogen.

The cartridge, which was specifically designed and patented by centrotherm, is available in different sizes with various options and filled with granules based on the individual customer's application. For specific applications we use one or more different granules, which absorb the toxic, corrosive and/ or inflammable products and by-products. Because of the irreversible chemical reaction with the granules at room temperature, the harmful gases are converted into non-volatile, inorganic solids.

To ensure a smooth production, we offer all our customers a sophisticated cartridge exchange and granule disposal service - worldwide. In detail this means that upon customer’s request a newly filled cartridge is shipped. The customer is than either replacing the cartridge on his own, alternatively the exchange will be carried out by our service team. The pick-up service of the spent cartridge and the disposal of the used up granules is organized by centrotherm, while the customer will receive a proof of waste disposal.
 
The CT-BW EPI point-of-use abatement is a highly efficient system used for EPI applications in the semiconductor industry. As new process tools and technologies with highly corrosive gases and increasing gas loads are introduced, further improvements in abatement technologies are needed. The CT-BW EPI meets those requirements and is in compliance with international safety standards. Furthermore it provides a couple of advantages such as a high destruction removal efficiency for all waste gases from EPI processes as well as all kinds of solid and gaseous reaction by-products. The system was designed for a reliable, resource- conserving performance even under harsh process conditions. The separation of the functional units such as process chamber pressure control, burner, combustion chamber, wet scrubber, waste gas inlet and cooling system allows a flexible setup for each application. The customized abatement configuration is key to keep the maintenance interval as long as possible and to maximize the uptime.
 
The CT-BW point-of-use abatement is a highly efficient system used in CVD and etching applications for photovoltaic, semiconductor and related industries. As new process tools and technologies with highly corrosive gases and increasing gas loads are introduced, further improvements in abatement technologies are needed. The CT-BW meets those requirements and is in compliance with international safety standards. furthermore it provides a couple of advantages such as a high destruction removal efficiency for all waste gases from CVD and etching processes, especially for PFCs as well as all kinds of solid and gaseous reaction by-products. The system was designed for a reliable, resource- conserving performance even under harsh process conditions. The separation of the functional units such as burner, combustion chamber, wet scrubber, waste gas inlet and cooling system allows a flexible setup for each application. The customized abatement configuration is key to keep the maintenance interval as long as possible and to maximize the uptime.