High productivity thanks to integration-capable substrate carrier
The DynaLine offers top-level productivity for the automotive industry, made possible by a substrate-carrier configuration which can be integrated into a fully automated conveyor system.
Flexible system configuration thanks to modular concept
The DynaLine is designed with a modular concept for flexible configuration. This particular design enables users to effortlessly expand the system with additional chambers. Integrating a new process chamber is possible even after a period of several years.
Advanced deposition technology offers excellent coating flexibility
Magnetron sputter deposition with inter-pole target (IPT) for the high-rate deposition of metals and advanced mid-frequency (MF) plasma-enhanced chemical vapor deposition (PECVD) for the deposition of siloxane top-coat form the backbone of the system, offering a variety of coating possibilities.
- Method: PECVD
- Technology: Magnetron sputtering
- Deposition type: Metalised film
- Other characteristics: Vacuum