DEPOSITION SOURCE OPTIONS
RF, DC, pulsed DC, HIPIMS, and reactive. Circular, linear & cylindrical cathodes are available.
You can utilize a wide range of boats, filaments & crucible heaters. Auto-tuning ensures precise rate control.
Electron Beam Evaporation
A wide range of source power and power supply options are available. Programmable sweep controller with recipe storage is controlled through Aeres software platform. A torque sensing crucible indexer detects pocket jams. There is room for multiple e-beam sources in the EvoVac chamber.
Plasma & Ion Beam Processing
We use a range of ion sources for cleaning and film enhancements, including glow discharge plasma cleaning.