Vacuum Chamber Cleaning
Vacuum Chamber Cleaning Products Enable Much Faster PM’s and Reduced Particle Levels
UltraSOLV® Chamber Cleaning products enable Equipment Engineers in the semiconductor industry to quickly and thoroughly clean process by-product from a wide range of vacuum chambers. In 200mm and the most advanced 300mm wafer fabs, equipment wet cleans have been improved in the following manner:
• Scotch-Brite™ and related particle contamination have been eliminated from the fab
• Hazardous chemicals such as H2O2, IPA, and Acetone have significantly been reduced or eliminated
• MiraWIPE® and MiraSAT® improve Post PM particles and first-pass QUAL rates.
• MiraSAT® and MiraWIPE’s tightly woven microfiber fabric eliminate the risk of fiber scratch defects when cleaning transfer robots, front end modules and end effectors
• MiraSAT® and MiraWIPE’s excellent particle pickup and absorbency greatly reduce equipment pump down times especially for tools cleaned with Ultrapure Water